The FRT FTR bases on the superposition of light beams reflected at the boundaries of a thin film. The evaluation of the spectral interference pattern of the superposed light beams results in the film thickness. This measured reflectance spectrum is compared with a calculated one, where the unknown thickness is systematically varied until both spectra match.
	measurement of thin films by spectral reflectance non-destructive, non-contact, high-resolution measurement (10nm – 100µm) in less than a few seconds measurement of single or multi-layer films	Download Options   Product Sheet   Company Brochure
	measurement of thickness of oxides, nitrides, photoresist and other semiconductor process films measurement of antireflection coatings and antiscratch coatings measurement on opaque substrates e.g. aluminum, brass, ceramics, copper, steel and plastics measurement of thin films in the optics industry measurement of lacquers and thin foils
	model VIS  NIR VIS/NIR UV/VIS UV/VIS/NIR  wavelength 400 nm – 850 nm 650 nm – 1100 nm 400 nm – 1100 nm 250 nm – 850 nm 250 nm – 1100 nm  measuring range 50 nm – 20 µm 70 nm – 70 µm 50 nm – 100 µm 20 nm – 20 µm 20 nm – 70 µm  light source halogen deuterium halogen  resolution thickness 1 nm  resolution x,y 200 µm - 800 µm without extra optic (better than 10 µm with extra optic) Technical specifications and content are subject to change.